Products & Services
Photoresist manufacturing
The electronic grade solvent of Shiny is mainly for using in semiconductor process, flat screen monitor, encapsulation and testing, and the manufacturing of emission diode and photoresist. The ceaseless advancement of semiconductor production process dictates for continued improvement of high purity and high quality of electronic grade solvent that drives Shiny to make perpetual improvement. Product specification could be customized to individual needs of customers. For further information on our products or any others, please contact our sale representatives of the Electronic Chemicals Section, or leave us information for liaison with you. We will assign designated personnel to contact you.
- Semiconductor
- Flat Screen Monitor
- Photoresist manufacturing
- Bumping & Packaging industry
- LED industry
Name | CAS | Use Range | SDS | SPEC |
---|---|---|---|---|
N-Butyl Acetate |
123-86-4 | A photoresist solubilizer. | SDS | SPEC |
Cyclohexanone |
108-94-1 | Often used as a PI photoresist developer. | SDS | SPEC |
Propylene Glycol Monomethyl Ether Acetate(PGMEA) |
108-65-6 | Primarily used as an EBR and ingredient for other EBRs. | SDS | SPEC |
Propylene Glycol Monomethyl Ether(PGME) |
107-98-2 | Primarily used as an ingredient for edge bead removers (EBR). | SDS | SPEC |
Ethyl 3-ethoxypropionate |
763-69-9 | Often used as a negative photoresist solubilizer. | SDS | SPEC |
Isopropyl Alcohol |
67-36-0 | Used for the production of acetone and its derivatives. Used for the production of glycerin and isopropyl acetate. Essential oil and other oils. | SDS | SPEC |
Acetone |
67-64-1 | General cleaning and hi-tech industry cleaning processes. | SDS | SPEC |
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